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E-Beam (+IAD)
- Moderate reflectance > 99.9%
- Low absorption < 1 ppm
- Hybrid or metallic coatings
- Highest LIDT for pulsed – ns
Magnetron Sputtering (MS)
- High reflectance > 99.99 %
- Near bulk density
- Suitable for temperature sensitive substrates
- Highest LIDT for CW (> 100 kW/cm)
Ion Beam Sputtering (IBS)
- Highest reflectance > 99.999 %
- Lowest losses < 0.05 %
- Low absorption < 1 ppm
- Uniform coatings
- Near bulk density
- Suitable for temperature sensitive substrates
- Highest LIDT for pulsed – ps/fs and CW
Atomic Layer Deposition (ALD)
- Uniform coatings
- Suitable for strongly curved substrates
SOL-GEL Nanoimprinting
- Low reflectance for wide wavelength range and wide AOI (0-45°)
- High LIDT >140 J/cm2, 1064 nm, 10 ns